Magnetron sputtering target CHINA NEW METAL MATERIALS TECHNOLOGY CORP High pure metal sputtering target:
al, cr, cu, ni, si, ge, nb, ti, in, ag, sn, graphite, ta, mo, au, hf, mn, zr, mg, zn, pb, ir, y, ce, la, yb, gd, pt target
high density ceramic sputtering target: ito target, azo target,igzo target, mgo, y2o3, fe2o3, ni2o3, cr2o3, zno, zns, cds, mos2, sio2, sio, zro2, nb2o5, tio2, hfo2, tib2, zrb2, wo3, al2o3, ta2o5, mgf2, znse, aln, si3n4, bn,tin, sic, linbo3, batio3, latio3, prtio3 target, etc.
note: the ceramic target produced in cnm adopts the most adv... |  | |